Chemistry for electron-induced nanofabrication

• Petra Swiderek,
• Hubertus Marbach and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2018, 9, 1317–1320, doi:10.3762/bjnano.9.124

• characteristic range of electron energies and leads to different dissociative reactions. It is thus tempting to try to exploit this phenomenon to achieve control over chemistry during electron beam processing. For instance, electron impact ionization initiates fragmentation (named dissociative ionization (DI

Comparing postdeposition reactions of electrons and radicals with Pt nanostructures created by focused electron beam induced deposition

• Julie A. Spencer,
• Michael Barclay,
• Miranda J. Gallagher,
• Robert Winkler,
• Ilyas Unlu,
• Yung-Chien Wu,
• Harald Plank,
• Lisa McElwee-White and
• D. Howard Fairbrother

Beilstein J. Nanotechnol. 2017, 8, 2410–2424, doi:10.3762/bjnano.8.240

• of AO restricts its effectiveness as a purification strategy to relatively small nanostructures. Keywords: atomic hydrogen; atomic oxygen; electron beam processing; focused electron beam induced deposition (FEBID); purification; Introduction Focused electron beam induced deposition (FEBID) has

• oxygen or water. In these techniques, the electron beam dissociates gas phase reactants to yield reactive oxygen species, which then convert deposited carbon into volatile compounds such as CO and CO2 [16][17][18][19]. Villamor et al. [20] observed that either by post deposition electron beam processing

• in this investigation are estimated to be at least 200 nm thick. Figure 1b shows the effects of in situ electron beam processing of a PtCl2 deposit, as measured by AES. During the first 7 h of electron beam irradiation, the Cl atom % decreased significantly, leading to a concomitant increase in Pt

Continuum models of focused electron beam induced processing

• Milos Toth,
• Charlene Lobo,
• Vinzenz Friedli,
• Aleksandra Szkudlarek and
• Ivo Utke

Beilstein J. Nanotechnol. 2015, 6, 1518–1540, doi:10.3762/bjnano.6.157

• continuum FEBIP models. Keywords: continuum model; deposition; electron beam processing; etching; gas injection system; Review Introduction to continuum models of focused electron beam induced processing (FEBIP) Continuum FEBIP models enable the simulation of process rates that govern focused electron